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Chinese Journal of Lasers, Volume. 23, Issue 9, 819(1996)

Diffraction Analysis on Deep-etch Continuous Phase Relief Microoptical Elements

[in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]2, [in Chinese]2, and [in Chinese]2
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    [1] Xu Haidong, Xu Ping, Qi Senlin, Liang Qian, Zhang Xulin, Huang Jiefeng, Huang Haixuan. System Optimization of 4f-Based Planar-Integrated Hybrid-Optoelectronic Correlator[J]. Acta Optica Sinica, 2010, 30(4): 1002

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Diffraction Analysis on Deep-etch Continuous Phase Relief Microoptical Elements[J]. Chinese Journal of Lasers, 1996, 23(9): 819

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    Paper Information

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    Received: Sep. 27, 1995

    Accepted: --

    Published Online: Dec. 4, 2006

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    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology