Effect of grain size on ferroelectric and dielectric properties of <inline-formula><math display="inline" overflow="scroll" xmlns:mml="http://www.w3.org/1998/Math/MathML"><msub><mrow><mtext>Bi</mtext></mrow><mrow><mstyle mathvariant="bold"><mn>3</mn><mo class="MathClass-punc">.</mo><mn>2</mn><mn>5</mn></mstyle></mrow></msub></math></inline-formula><inline-formula><math display="inline" overflow="scroll" xmlns:mml="http://www.w3.org/1998/Math/MathML"><msub><mrow><mtext>La</mtext></mrow><mrow><mstyle mathvariant="bold"><mn>0</mn><mo class="MathClass-punc">.</mo><mn>7</mn><mn>5</mn></mstyle></mrow></msub></math></inline-formula><inline-formula><math display="inline" overflow="scroll" xmlns:mml="http://www.w3.org/1998/Math/MathML"><msub><mrow><mtext>Ti</mtext></mrow><mrow><mstyle mathvariant="bold"><mn>3</mn></mstyle></mrow></msub></math></inline-formula><inline-formula><math display="inline" overflow="scroll" xmlns:mml="http://www.w3.org/1998/Math/MathML"><msub><mrow><mtext>O</mtext></mrow><mrow><mstyle mathvariant="bold"><mn>1</mn><mn>2</mn></mstyle></mrow></msub></math></inline-formula> thin films prepared by rf-magnetron sputtering

Shuai Ma; Wei Li; Jigong Hao; Yuying Chen; Zhijun Xu

doi:10.1142/S2010135X23500170

Journal of Advanced Dielectrics, Volume. 13, Issue 5, 2350017(2023)

Effect of grain size on ferroelectric and dielectric properties of ${Bi}_{3.25}$ ${La}_{0.75}$ ${Ti}_{3}$ $O_{12}$ thin films prepared by rf-magnetron sputtering

Shuai Ma^1,2、*, Wei Li³, Jigong Hao³, Yuying Chen¹, and Zhijun Xu⁴

Author Affiliations

¹School of Medicine, Liaocheng University, Liaocheng 252059, P. R. China

²Beijing Key Laboratory of Digital Stomatology, Beijing 100081, P. R. China

³School of Materials Science and Engineering, Liaocheng University, Liaocheng 252059, P. R. China

⁴School of Environment and Materials Engineering, Yantai University, Yantai 264005, P. R. China

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Shuai Ma, Wei Li, Jigong Hao, Yuying Chen, Zhijun Xu. Effect of grain size on ferroelectric and dielectric properties of ${Bi}_{3.25}$ ${La}_{0.75}$ ${Ti}_{3}$ $O_{12}$ thin films prepared by rf-magnetron sputtering[J]. Journal of Advanced Dielectrics, 2023, 13(5): 2350017

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Paper Information

Category: Research Articles

Received: Jun. 25, 2023

Accepted: Jul. 23, 2023

Published Online: Nov. 21, 2023

The Author Email: Shuai Ma (mashuai@lcu.edu.cn)

DOI:10.1142/S2010135X23500170

CSTR:32405.14.S2010135X23500170

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology