[2] [2] Peter A. Burke. Semi-empirical modeling of SiO2 chemical-mechanical polishing planarization [C]. VMIC Conference, 1991. 379～384

[3] [3] Lee M. Cook. Chemical process in glass polishing [J]. Journal of Non-Crystalline Solids, 1990, 120(1-2):152～171

[4] [4] Gerd Nanz, Lawrence E. Camilletti. Modeling of chemical-mechanical polishing: a review [J]. IEEE Transactions on Semiconductor Manufacturing, 1995, 8(4):382～388

[5] [5] Stavros G. Demos, Mike Staggs, Mark R. Kozlowski. Investigation of processes leading to damage growth in optical materials for large-aperture lasers [J]. Appl. Opt., 2002, 41(18):3628～3633

[7] [7] W. Howard Lowdermilk, David Milam. Laser-include surface and coating damage [J]. IEEE J. Quantum Electron., 1981, QE-17(9):1888～1903