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Acta Optica Sinica, Volume. 38, Issue 7, 0712004(2018)

High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations

Boer Zhu1,2, Sikun Li1,2、*, Xiangzhao Wang1,2, Fengzhao Dai1,2, Feng Tang1,2, and Lifeng Duan3
Author Affiliations
  • 1 Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2 University of Chinese Academy of Sciences, Beijing 100049, China
  • 3 Shanghai Micro Electronics Equipment (Group) Co., Ltd., Shanghai 201203, China
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    AbstractGet PDF(in Chinese)
    Figures&Tables (12)
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    References (23)
    Cited By (2)
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    Figures & Tables(12)
    Schematic of an optical lithographic imaging system

    Fig. 1. Schematic of an optical lithographic imaging system

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    Schematic of linear sampling

    Fig. 2. Schematic of linear sampling

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    Process of high-order wave aberration based on the proposed technique

    Fig. 3. Process of high-order wave aberration based on the proposed technique

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    Illumination types. (a) x-polarization; (b) y-polarization

    Fig. 4. Illumination types. (a) x-polarization; (b) y-polarization

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    Schematic of the test target at different directions

    Fig. 5. Schematic of the test target at different directions

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    Aerial images. (a) x-polarized illumination; (b) y-polarized illumination; (c) difference of polarized illumination between x and y directions

    Fig. 6. Aerial images. (a) x-polarized illumination; (b) y-polarized illumination; (c) difference of polarized illumination between x and y directions

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    Measurement results (Z5-Z64) obtained by the proposed technique

    Fig. 7. Measurement results (Z5-Z64) obtained by the proposed technique

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    Measurement results (Z5-Z64) obtained by the previous method. (a) x-polarized illumination; (b) y-polarized illumination

    Fig. 8. Measurement results (Z5-Z64) obtained by the previous method. (a) x-polarized illumination; (b) y-polarized illumination

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    Polarized illumination types. (a) Radial polarization; (b) tangential polarization

    Fig. 9. Polarized illumination types. (a) Radial polarization; (b) tangential polarization

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    Measurement results (Z5-Z64) obtained by the proposed technique

    Fig. 10. Measurement results (Z5-Z64) obtained by the proposed technique

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    • Table 1. Simulation settings

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      Table 1. Simulation settings

      Proposed techniquePrevious method
      Source
      Wavelength λ /nm193193
      Illumination typequadrupole illuminationquadrupole illumination
      Polarization typex-polarization & y-polarizationx-polarization /y-polarization
      Partial coherence factors σcen,σrad0.8,0.30.8,0.3
      Detected target
      Pattern of the targetbinary targetbinary target
      Linewidth of the target /nm250250
      Pitch of the target /nm30003000
      Orientation0°,30°,45°,60°,90°,120°,135°,150°0°,30°,45°,60°,90°,120°,135°,150°
      Statistical sampling method
      Statistical samplingLinear samplingBox-Behnken Design
      Projection lens
      NA1.351.35
      Input aberration typeZ5-Z64Z5-Z64
      Input single aberration valueZ5-Z36:-0.02λ-0.02λ:Z37-Z64:-0.01λ-0.01λZ5-Z36:-0.02λ-0.02λZ37-Z64:-0.01λ-0.01λ
      Polarization aberrationRea0-Rea3:-0.15-0.15Ima0=0Ima1-Ima3:-0.02λ-0.02λRea0-Rea3:-0.15-0.15Ima0=0Ima1-Ima3:-0.02λ-0.02λ
      Lithographic image model
      Lithographic image modelVector imaging modelVector imaging model
      Aerial image sampling
      Sampling range /nmx/y direction: -900-900z direction: -2000-2000x/y direction: -900-900z direction: -2000-2000
      Sampling interval /nmx/y direction: 30z direction: 125x/y direction: 30z direction: 125

    • Table 2. High-order aberrations measurement results at different illuminations

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      Table 2. High-order aberrations measurement results at different illuminations

      IlluminationmodePartial coherencefactorsMaximum meanerror /nmMaximum standarderror /nmAccuracy /nm
      Conventional illuminationσ=0.650.07910.13180.4446
      Annular illumination[σout, σin]=[0.9,0.7]0.01820.07480.2284
      Dipole illumination[σcen,σrad]=[0.8,0.2]0.01740.05910.1853
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    Boer Zhu, Sikun Li, Xiangzhao Wang, Fengzhao Dai, Feng Tang, Lifeng Duan. High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations[J]. Acta Optica Sinica, 2018, 38(7): 0712004

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Jan. 24, 2018

    Accepted: --

    Published Online: Sep. 5, 2018

    The Author Email: Li Sikun (lisikun@siom.ac.cn)

    DOI:10.3788/AOS201838.0712004

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology