Acta Optica Sinica, Volume. 42, Issue 9, 0912002(2022)

Scratch Evolution for Monocrystalline Silicon During Chemical-Mechanical Polishing

Jingjing Xia, Jun Yu*, Zhanshan Wang, and Siwen Lu
Author Affiliations
  • Institute Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
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    Jingjing Xia, Jun Yu, Zhanshan Wang, Siwen Lu. Scratch Evolution for Monocrystalline Silicon During Chemical-Mechanical Polishing[J]. Acta Optica Sinica, 2022, 42(9): 0912002

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Sep. 26, 2021

    Accepted: Nov. 22, 2021

    Published Online: May. 6, 2022

    The Author Email: Jun Yu (yujun_88831@tongji.edu.cn)

    DOI:10.3788/AOS202242.0912002

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