Method to accurate calibrate deposition rates of EUV multilayer coatings

Lichao Zhang; Jinsong Gao

doi:10.3788/col201311.s10605

Chinese Optics Letters, Volume. 11, Issue s1, S10605(2013)

Method to accurate calibrate deposition rates of EUV multilayer coatings

Lichao Zhang and Jinsong Gao

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References(5)

[1] [1] D. T. Attowood, Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications (Cambridge University Press, Cambridge, 1999).

[2] [2] E. Spiller, Soft X-Ray Optics (SPIE Press, Bellingham, 1994).

[3] [3] E. Spiller, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, A. M. Khounsary, (ed.) (SPIE Press, San Diego, 2003) p. 89.

[4] [4] R. S. Rosen, D. G. Stearns, M. A. Viliardos, M. E. Kassner, S. P. Vernon, and Y. Cheng, Appl. Opt. 32, 6975 (1993).

[5] [5] F. Wang, Z. Wang, J. Zhu, Z. Zhang, W. Wu, S. Zhang, and L. Chen, Chin. Opt. Lett. 4, 550 (2006).

Cited By

[1] Jiaoling Zhao, Kui Yi, Hu Wang, Ming Fang, Bin Wang, Guohang Hu, Hongbo He.

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Lichao Zhang, Jinsong Gao, "Method to accurate calibrate deposition rates of EUV multilayer coatings," Chin. Opt. Lett. 11, S10605 (2013)

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Paper Information

Category: Duv/euv coatings

Received: Jan. 4, 2013

Accepted: Feb. 5, 2013

Published Online: Jun. 10, 2013

The Author Email:

DOI:10.3788/col201311.s10605

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology