Microelectronics, Volume. 51, Issue 3, 429(2021)

Analysis of Geometric Effect on 8-Shape NMOS Under TID

WU Yucao, LUO Ping, and JIANG Pengkai
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    References(6)

    [1] [1] BUCHER M,NIKOLAOU A, PAPADOPOULOU A, et al. Total ionizing dose effects on analog performance of 65 nm bulk CMOS with enclosed-gate and standard layout [C] // IEEE ICMTS. Austin, TX, USA. 2018: 166-170.

    [2] [2] GIRALDOA, PACCAGNELLA A, MINZONI A. Aspect ratio calculation in N-channel MOSFETs with a gate-enclosed layout [J]. Sol Sta Elec, 2000, 44(6): 981-989.

    [3] [3] VAZ P I, BOTH T H, VIDOR F F, et al. Design flow methodology for radiation hardened by design CMOS enclosed-layout-transistor-based standard-cell library [J]. J Elec Test, 2018, 34: 735-747.

    [4] [4] FAN X,LI P, LI W, et al. Gate-enclosed NMOS transistors [J]. J Semicond, 2011, 32(8): 0804022.

    [5] [5] SNOEYS W J, GUTIERREZ T A P, ANELLI G. A new NMOS layout structure for radiation tolerance [J].IEEE Trans Nucl Sci, 2002, 49(4): 1829-1833.

    [9] [9] FLEETWOOD D M. Evolution of total ionizing dose effects in MOS devices with Moore’s law scaling [J]. IEEE Trans Nucl Sci, 2018, 65(8): 1465-1481.

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    WU Yucao, LUO Ping, JIANG Pengkai. Analysis of Geometric Effect on 8-Shape NMOS Under TID[J]. Microelectronics, 2021, 51(3): 429

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    Paper Information

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    Received: Aug. 27, 2020

    Accepted: --

    Published Online: Mar. 11, 2022

    The Author Email:

    DOI:10.13911/j.cnki.1004-3365.200395

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