Microelectronics, Volume. 51, Issue 3, 429(2021)
Analysis of Geometric Effect on 8-Shape NMOS Under TID
[1] [1] BUCHER M,NIKOLAOU A, PAPADOPOULOU A, et al. Total ionizing dose effects on analog performance of 65 nm bulk CMOS with enclosed-gate and standard layout [C] // IEEE ICMTS. Austin, TX, USA. 2018: 166-170.
[2] [2] GIRALDOA, PACCAGNELLA A, MINZONI A. Aspect ratio calculation in N-channel MOSFETs with a gate-enclosed layout [J]. Sol Sta Elec, 2000, 44(6): 981-989.
[3] [3] VAZ P I, BOTH T H, VIDOR F F, et al. Design flow methodology for radiation hardened by design CMOS enclosed-layout-transistor-based standard-cell library [J]. J Elec Test, 2018, 34: 735-747.
[4] [4] FAN X,LI P, LI W, et al. Gate-enclosed NMOS transistors [J]. J Semicond, 2011, 32(8): 0804022.
[5] [5] SNOEYS W J, GUTIERREZ T A P, ANELLI G. A new NMOS layout structure for radiation tolerance [J].IEEE Trans Nucl Sci, 2002, 49(4): 1829-1833.
[9] [9] FLEETWOOD D M. Evolution of total ionizing dose effects in MOS devices with Moore’s law scaling [J]. IEEE Trans Nucl Sci, 2018, 65(8): 1465-1481.
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WU Yucao, LUO Ping, JIANG Pengkai. Analysis of Geometric Effect on 8-Shape NMOS Under TID[J]. Microelectronics, 2021, 51(3): 429
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Received: Aug. 27, 2020
Accepted: --
Published Online: Mar. 11, 2022
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