14.1 W continuous-wave dual-end diode-pumped Er:Lu<sub>2</sub>O<sub>3</sub> laser at 2.85 µm

Yangyang Liang; Tao Li; Baitao Zhang; Jingliang He; Sascha Kalusniak; Xian Zhao; Christian Kränkel

doi:10.3788/COL202422.011403

Chinese Optics Letters, Volume. 22, Issue 1, 011403(2024)

14.1 W continuous-wave dual-end diode-pumped Er:Lu₂O₃ laser at 2.85 µm

Yangyang Liang^1,2, Tao Li^1,2,3、*, Baitao Zhang³, Jingliang He³, Sascha Kalusniak⁴, Xian Zhao^2,3, and Christian Kränkel⁴

Author Affiliations

¹Key Laboratory of Laser & Infrared System, Ministry of Education, Shandong University, Qingdao 266237, China

²School of Information Science and Engineering, Shandong Provincial Key Laboratory of Laser Technology and Application, Shandong University, Qingdao 266237, China

³Institute of Novel Semiconductors, State Key Laboratory of Crystal Materials, Shandong University, Jinan 250100, China

⁴Leibniz-Institut für Kristallzüchtung (IKZ), Berlin 12489, Germany

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Yangyang Liang, Tao Li, Baitao Zhang, Jingliang He, Sascha Kalusniak, Xian Zhao, Christian Kränkel, "14.1 W continuous-wave dual-end diode-pumped Er:Lu₂O₃ laser at 2.85 µm," Chin. Opt. Lett. 22, 011403 (2024)

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Paper Information

Category: Lasers, Optical Amplifiers, and Laser Optics

Received: Sep. 5, 2023

Accepted: Sep. 18, 2023

Published Online: Jan. 9, 2024

The Author Email: Tao Li (litao@sdu.edu.cn)

DOI:10.3788/COL202422.011403

CSTR:32184.14.COL202422.011403

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology