Chinese Optics Letters, Volume. 11, Issue 9, 090802(2013)
Glass homogeneity effect on wavefront aberration in lithography projection lens
Analysis of glass homogeneity using the attaching interferometric data model neglects body distribution. To improve analysis accuracy, we establish the three-dimensional gradient index (GRIN) model of glass index by analyzing fused silica homogeneity distribution in two perpendicular measurement directions. Using the GRIN model, a lithography projection lens with a numerical aperture of 0.75 is analyzed. Root mean square wavefront aberration deteriorates from 0.9 to 9.65 nm and then improves to 5.9 nm after clocking.
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Hongbo Shang, Wei Huang, Chunlai Liu, Weicai Xu, Wang Yang, "Glass homogeneity effect on wavefront aberration in lithography projection lens," Chin. Opt. Lett. 11, 090802 (2013)
Category: Geometric Optics
Received: Apr. 29, 2013
Accepted: Aug. 2, 2013
Published Online: Sep. 3, 2013
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