Acta Optica Sinica, Volume. 25, Issue 4, 533(2005)
Research of Mask Division for Improving the Edge Sharpness of Photolithography
References(1)
[1] [1] Levenson M D. Wavefront engineering from 500 nm CD to 100 nm CD[C]. Proc. SPIE, 1997, 3049
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Research of Mask Division for Improving the Edge Sharpness of Photolithography[J]. Acta Optica Sinica, 2005, 25(4): 533
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