Laser & Optoelectronics Progress, Volume. 57, Issue 9, 090001(2020)
Research Progress of Achromatic Technology in Ultra-Short and Ultra-Intense Laser Facility
Fig. 1. Chromatic aberration of SGII 5 PW device. (a)PTD caused by accumulated chromatic aberration the spatial filter; (b) terminal focal spot dispersion caused by chromatic aberration
Fig. 2. Wave front deviation caused by chromatic aberration at the end of the SGII 5 PW device. (a) 858 nm wave front; (b) 758 nm wave front; (c) change in wave front deviation with lens radius
Fig. 6. Chromatic aberration compensation unit of Offner structure. (a) Schematic diagram; (b) Sketch of MTW-OPAL facility [20]
Fig. 12. Optical schematic of amplification stage and PTD compensator of XG-PW[50]
Fig. 14. Changes in the focal of the terminal before and after chromatic aberration compensation[14]. (a) Focal spot before compensation; (b) focal spot after compensation; (c) horizontal and longitudinal spatial distribution before compensation; (d) horizontal and longitudinal spatial distribution of focal spot after compensation
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Jun Kang, Ziruo Cui, Ping Zhu, qi Gao, Ailin Guo, Haidong Zhu, Qingwei Yang, Meizhi Sun, Xinglong Xie, Jianqiang Zhu. Research Progress of Achromatic Technology in Ultra-Short and Ultra-Intense Laser Facility[J]. Laser & Optoelectronics Progress, 2020, 57(9): 090001
Category: Reviews
Received: Aug. 29, 2019
Accepted: Sep. 24, 2019
Published Online: May. 6, 2020
The Author Email: Jun Kang (kangjun@siom.ac.cn), Ziruo Cui (ziruocui@siom.ac.cn)