High Power Laser and Particle Beams, Volume. 34, Issue 12, 125001(2022)

Effect of different nitrogen ion implantation parameters on surface charge accumulation and dissipation characteristics of polytetrafluoroethene

Youhui He1,2, Hongbin Chen2, Fei Li2, and Falun Song2、*
Author Affiliations
  • 1Graduate School of China Academy of Engineering Physics, Mianyang 621900, China
  • 2Institute of Applied Electronics, CAEP, Mianyang 621900, China
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    Figures & Tables(11)
    Full spectrum of XPS on PTFE surface under different treatment conditions
    [in Chinese]
    XPS C spectra of PTFE surface under different pulse voltage and nitrogen flow
    XPS C spectra of PTFE surface treated with different RF source power and pulse voltage widths
    XPS N spectra of PTFE surface under different treatment conditions
    Surface morphology of PTFE under different nitrogen flow treatments
    Effect of different treatment conditions on the surface resistivity of PTFE samples
    Attenuation characteristics of central potential on PTFE surface under different treatment conditions
    Distribution characteristics of traps on PTFE surface under different treatment conditions
    • Table 1. Treatment conditions of experimental samples

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      Table 1. Treatment conditions of experimental samples

      No.voltage/kVpulse width/μspower/Wprocessed time/hnitrogen flow/(cm3·min−1)
      1~5350200110~40
      6~10550200110~40
      11~15750200110~40
      16~17325,75200120
      18~9525,75200120
      20725200120
      21~25550100110~30
      26~29550400110~40
    • Table 2. Radicals and proportion of C elements in PTFE sample surface before and after ion implantation

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      Table 2. Radicals and proportion of C elements in PTFE sample surface before and after ion implantation

      sample numberprocessing parametersproportion of C element/%
      CF3CF2CFC=OC−OCF3
      13 kV-50 μs, 10 cm3/min, 200 W, 1 h 0.0044.021.298.627.4437.45
      23 kV-50 μs, 20 cm3/min, 200 W, 1 h 1.3625.901.0511.6514.1742.38
      33 kV-50 μs, 40 cm3/min, 200 W, 1 h 5.3161.341.502.513.4823.41
      45 kV-50 μs, 10 cm3/min, 200 W, 1 h 0.8526.140.408.099.0053.73
      55 kV-50 μs, 20 cm3/min, 200 W, 1 h 0.3343.080.449.728.2737.78
      65 kV-50 μs, 40 cm3/min, 200 W, 1 h 1.3223.050.138.819.0662.07
      77 kV-50 μs, 40 cm3/min, 200 W, 1 h 2.1967.943.442.797.4621.13
      87 kV-50 μs, 20 cm3/min, 200 W, 1 h 1.6163.032.684.755.0121.69
      97 kV-50 μs, 10 cm3/min3, 100 W, 1 h 2.1757.365.347.606.5525.69
      103 kV-25 μs, 20 cm3/min, 100 W, 1 h 1.0341.131.8011.198.8137.74
      113 kV-50 μs, 20 cm3/min, 100 W, 1 h 2.1059.951.949.268.6216.33
      125 kV-50 μs, 10 cm3/min, 100 W, 1 h 1.0819.592.015.7610.7264.25
      135 kV-50 μs, 20 cm3/min3, 100 W, 1 h 020.680.149.875.8661.92
      145 kV-50 μs, 40 cm3/min3, 100 W, 1 h 0.0010.841.184.7810.1272.34
      155 kV-50 μs, 10 cm3/min3, 400 W, 1 h 3.3466.433.015.654.989.53
      165 kV-50 μs, 20 cm3/min3, 400 W, 1 h 3.6950.593.6710.8410.7017.97
      175 kV-50 μs, 40 cm3/min, 400 W, 1 h 4.9761.312.327.933.9319.92
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    Youhui He, Hongbin Chen, Fei Li, Falun Song. Effect of different nitrogen ion implantation parameters on surface charge accumulation and dissipation characteristics of polytetrafluoroethene[J]. High Power Laser and Particle Beams, 2022, 34(12): 125001

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    Paper Information

    Category: Pulsed Power Technology

    Received: Aug. 1, 2022

    Accepted: --

    Published Online: Nov. 10, 2022

    The Author Email: Song Falun (songfalun@caep.cn)

    DOI:10.11884/HPLPB202234.220213

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