Chinese Journal of Liquid Crystals and Displays, Volume. 39, Issue 1, 40(2024)
Performances and preparation of zinc-tin oxide thin-film transistors
Fig. 2. Transmittance of ZTO thin films with different sputtering powers in the range of 200~800 nm
Fig. 4. AFM images of ZTO films with different sputtering powers.(a)70 W;(b)80 W;(c)90 W;(d)100 W.
Fig. 6. O1s spectra of ZTO films with different sputtering powers.(a)70 W;(b)80 W;(c)90 W;(d)100 W.
Fig. 7. (a)Transfer characteristic curves,IDS1/2-VGS of ZTO thin film transistor under different sputtering power,(b)Output curves at 90 W.
Fig. 8. The bias stress test results of ZTO thin-film transistors prepared under different sputtering powers.(a)Positive bias stress;(b)Negative bias stress.
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Xuefeng CHU, Xiaojun HU, Qi ZHANG, Linmao HUANG, Yihan XIE. Performances and preparation of zinc-tin oxide thin-film transistors[J]. Chinese Journal of Liquid Crystals and Displays, 2024, 39(1): 40
Category: Research Articles
Received: Nov. 2, 2023
Accepted: --
Published Online: Mar. 27, 2024
The Author Email: Xuefeng CHU (stone2009@126.com)