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Optoelectronic Technology, Volume. 43, Issue 2, 129(2023)

Preparation of Monochrome Micro LED Microdisplay Chip Based on 200 mm Silicon‑based GaN and Analysis of its Batch Production Difficulties

Jinsong PENG1, Jianbing YANG1, Zhao YIN1, Zengfeng WANG1, Qi SONG1, and Yan WU2
Author Affiliations
  • 1Nanjing Guozhao Optoelectronic Technology Co., LTD., Nanjing 2006, CHN
  • 2The 55th Research Institute of China Electronics Technology Group Corporation, Nanjing 10016, CHN
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    Figures & Tables(8)
    Process flow diagram of Micro LED microdisplay chip

    Fig. 1. Process flow diagram of Micro LED microdisplay chip

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    Profile schematic of Micro LED microdisplay array

    Fig. 2. Profile schematic of Micro LED microdisplay array

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    Topography of Micro LED microdisplay pixel array

    Fig. 3. Topography of Micro LED microdisplay pixel array

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    I‑V characteristics of Micro LED microdisplay array

    Fig. 4. I‑V characteristics of Micro LED microdisplay array

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    I‑L characteristics of Micro LED microdisplay array

    Fig. 5. I‑L characteristics of Micro LED microdisplay array

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    Display pictures of Micro LED microdisplay array

    Fig. 6. Display pictures of Micro LED microdisplay array

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    Display defects of Micro LED microdisplay chip

    Fig. 7. Display defects of Micro LED microdisplay chip

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    • Table 1. Main defects and improving measurements

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      Table 1. Main defects and improving measurements

      序号缺陷类型表现形式可能原因建议改善措施
      1

      宏观不均匀性

      视觉缺陷

      		片状缺陷大面积片状污染物工艺控制与清洗
      光刻焦平面失真大面积光刻时的焦平面精确校准
      划线状缺陷人为、设备接触式划伤工艺控制与排故
      高台阶、大颗粒在旋转工艺中放大台阶与光刻优化；大颗粒控制与清洁
      环形缺陷工艺产生气泡流体控制、台阶优化等
      2

      像素级亮度

      不均匀性缺陷

      		邻近像素亮度明显差异像素导通电学差异像素图形化工艺控制与清洁、阴阳极导通电阻优化、外延质量提升[2]等
      3

      像素级

      坏点缺陷

      		像素级亮点像素驱动电路电流失控像素驱动控制管工艺及设计优化
      像素级暗点像素驱动电路断路像素驱动电路接口清洁
      二极管断路阴阳极接口清洁
      颗粒遮挡光路工艺控制与清洁
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    Jinsong PENG, Jianbing YANG, Zhao YIN, Zengfeng WANG, Qi SONG, Yan WU. Preparation of Monochrome Micro LED Microdisplay Chip Based on 200 mm Silicon‑based GaN and Analysis of its Batch Production Difficulties[J]. Optoelectronic Technology, 2023, 43(2): 129

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    Paper Information

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    Received: Mar. 1, 2023

    Accepted: --

    Published Online: Aug. 31, 2023

    The Author Email:

    DOI:10.19453/j.cnki.1005-488x.2023.02.004

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology