Chinese Journal of Lasers, Volume. 14, Issue 4, 237(1987)

Effect of background pressure on fast electrons produced from metal target vaporized by laser

He Wei1, Wu Zixia1, Cui Jumwen2, Hu Qiquan2, and Lin Fucheng2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    References(9)

    [2] [2] Κ. Dittrich, Wennricn; Prog. Analyt. Atom. Spectrosc, 1984, 7, 139.

    [3] [3] Ν. R. Isenor; J. Appl. Phys., 1965, 36, 317.

    [4] [4] S. Η. Khan et al.; IEEE J. Quant. Electr., 1965, QS-1, 359.

    [5] [5] T. U. Arifov et al; Sov. Phys. JETP, 1969, 28, 201.

    [6] [6] W. L. Kiiechet; Appl. Phys. Lett., 1966, 8, 254.

    [7] [7] J. F. Eeady; Effect of High-Power Laser Radidtion, Acadamic Press, New York, 1971, Chapter 4.

    [8] [8] R, E. Honing; "Laser Interaction and Related Plasma Phenomena, Vol 1, Ed by H.J.Schwarz and Η Hora, Plenum Press, New York, 1971, pp 85.

    [9] [9] H. Hora et al.; "Laser Acceleration of Particles”, Ed by P. J. Channell, American Institute of Physics, New York, 1982, pp.ll2.

    [10] [10] E. Jannitti et al.; "Laser Techniques for Extreme Ultraviolet Spectroscopy, Ed by J. J. Mcllrath and R. B. Freeman, American Institute of Physics, New York, 1982, pp243.

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    He Wei, Wu Zixia, Cui Jumwen, Hu Qiquan, Lin Fucheng. Effect of background pressure on fast electrons produced from metal target vaporized by laser[J]. Chinese Journal of Lasers, 1987, 14(4): 237

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    Paper Information

    Category: laser devices and laser physics

    Received: Nov. 6, 1985

    Accepted: --

    Published Online: Aug. 10, 2012

    The Author Email:

    DOI:

    CSTR:32186.14.

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