Opto-Electronic Engineering, Volume. 44, Issue 2, 216(2017)
The investigation of focusing characteristic based on double Bowtie nano-lithography structure
Figures & Tables(0)
Tools
Get Citation
Copy Citation Text
Jie Zheng, Xianchao Liu, Yuerong Huang, Yunyue Liu, Weidong Chen, Ling Li. The investigation of focusing characteristic based on double Bowtie nano-lithography structure[J]. Opto-Electronic Engineering, 2017, 44(2): 216
Paper Information
Category:
Received: Oct. 5, 2016
Accepted: --
Published Online: Mar. 31, 2017
The Author Email: Li Ling (lingli70@aliyun.com)
© Copyright 2018-2021 | Chinese Laser Press.
All Rights Reserved 沪ICP备15018463号-20