Acta Optica Sinica, Volume. 29, Issue 3, 794(2009)
Improving the Profiles of Imaging Patterns by Optimizing Mask in DMD-Based Maskless Photolithography
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Guo Xiaowei, Du Jinglei, Liu Yongzhi. Improving the Profiles of Imaging Patterns by Optimizing Mask in DMD-Based Maskless Photolithography[J]. Acta Optica Sinica, 2009, 29(3): 794
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