Laser & Optoelectronics Progress, Volume. 62, Issue 5, 0512001(2025)
Wavelength Phase-Shifting Interferometry for Simultaneous Profiling of Surface and Thickness Variation of Blank Mask (Invited)
Figures & Tables(14)
Fig. 1. Optical path of blank mask interferometry system with wavelength tuning interferometer
Fig. 2. Simulated wavefront distribution of front, rear surface and thickness variation
Fig. 3. Measurement at different cavity lengths. (a) Error of PV; (b) error of RMS
Fig. 5. Influence of the number of single-period samples of the fundamental signal and the thickness of the blank mask on the measurement. (a) Error of PV; (b) error of RMS
Fig. 6. Experimental setup of wavelength phase-shifting interferometry for blank mask
Fig. 8. Wrapping phases for wavefront of front, rear surface and thickness variation of blank mask
Fig. 9. Results of surface profiles for front, rear surface and thickness variation of blank mask
Fig. 10. Interferograms of a blank mask captured by CCD at different cavity lengths and the identical wavelength tuning
Fig. 11. Surface profiles for front surface of blank mask at different cavity lengths. (a) Cavity length of 18.5 mm; (b) cavity length of 27.7 mm; (c) cavity length of 37.0 mm; (d) cavity length of 46.2 mm; (e) cavity length of 55.5 mm
Table 1. Parameters of simulated wavefront distribution
View tableTable 1. Parameters of simulated wavefront distribution
Type Astigmatism Defocus Tilt-x Tilt-y Offset-z Front surface 0.1 0.45 -0.35 0.05 0.01 Rear surface 0.2 0.55 0.53 -0.05 0.02
Table 2. Repeated measurements of blank mask surface profile and thickness variation
View tableTable 2. Repeated measurements of blank mask surface profile and thickness variation
No. Front surface Rear surface Thickness variation ESEI PV RMS PV RMS PV RMS Standard deviation 4.77×10-4 2.12×10-5 2.07×10-4 2.55×10-5 4.35×10-4 2.59×10-5 2.40×10-6 1 0.0832 0.0120 0.0968 0.0147 0.0776 0.0110 7.5656×10-3 2 0.0831 0.0119 0.0967 0.0145 0.0774 0.0111 7.5608×10-3 3 0.0823 0.0120 0.0971 0.0146 0.0783 0.0112 7.5635×10-3
Table 3. Repeated measurements of blank mask surface profile and thickness variation at different cavity lengths
View tableTable 3. Repeated measurements of blank mask surface profile and thickness variation at different cavity lengths
Cavity length /mm Front surface Rear surface Thickness variation ESEI /λ0 PV /λ0 RMS /λ0 PV /λ0 RMS /λ0 PV /λ0 RMS /λ0 Standard deviation 8.1×10-3 6.67×10-4 7.6×10-3 6.87×10-4 6.9×10-3 9.12×10-4 8.24×10-5 18.5 0.0832 0.0120 0.0968 0.0147 0.0776 0.0112 7.5656×10-3 27.7 0.0942 0.0109 0.0869 0.0140 0.0808 0.0116 7.3641×10-3 37.0 0.0984 0.0119 0.0993 0.0146 0.0782 0.0111 7.5063×10-3 46.2 0.0980 0.0115 0.0980 0.0148 0.0812 0.0110 7.4066×10-3 55.5 0.0817 0.0127 0.0822 0.0158 0.0944 0.0132 7.4125×10-3
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Yonghao Zhou, Yingjie Yu, Zhiliang Zhao, Jiaxin Mo, Xingyu Lin, Wenjing Zhou. Wavelength Phase-Shifting Interferometry for Simultaneous Profiling of Surface and Thickness Variation of Blank Mask (Invited)[J]. Laser & Optoelectronics Progress, 2025, 62(5): 0512001
Paper Information
Category: Instrumentation, Measurement and Metrology
Received: Oct. 31, 2024
Accepted: Dec. 12, 2024
Published Online: Feb. 20, 2025
The Author Email: Wenjing Zhou (lazybee@shu.edu.cn)
CSTR:32186.14.LOP242196
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