Dual-symmetry-perturbed all-dielectric resonant metasurfaces for high-<i>Q</i> perfect light absorption

Junyang Ge; Yixiao Gao; Lei Xu; Ning Zhou; Xiang Shen

doi:10.3788/COL202422.023602

Chinese Optics Letters, Volume. 22, Issue 2, 023602(2024)

Dual-symmetry-perturbed all-dielectric resonant metasurfaces for high-Q perfect light absorption

Junyang Ge^1,2, Yixiao Gao^1,2、*, Lei Xu³, Ning Zhou⁴, and Xiang Shen^1,2,5

¹Laboratory of Infrared Materials and Devices, Research Institute of Advanced Technologies, Ningbo University, Ningbo 315211, China

²Key Laboratory of Photoelectric Detection Materials and Devices of Zhejiang Province, Ningbo 315211, China

³Advanced Optics & Photonics Laboratory, Department of Engineering, School of Science and Technology, Nottingham Trent University, Nottingham NG11 8NS, UK

⁴School of Physics and Optoelectronic Engineering, Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou 310024, China

⁵Ningbo Institute of Oceanography, Ningbo 315832, China

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Junyang Ge, Yixiao Gao, Lei Xu, Ning Zhou, Xiang Shen, "Dual-symmetry-perturbed all-dielectric resonant metasurfaces for high-Q perfect light absorption," Chin. Opt. Lett. 22, 023602 (2024)

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Paper Information

Category: Nanophotonics, Metamaterials, and Plasmonics

Received: Aug. 5, 2023

Accepted: Oct. 17, 2023

Published Online: Feb. 27, 2024

The Author Email: Yixiao Gao (gaoyixiao@nbu.edu.cn)

DOI:10.3788/COL202422.023602

CSTR:32184.14.COL202422.023602

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology