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Acta Optica Sinica, Volume. 44, Issue 3, 0322003(2024)

Design Method of Off-Axis Reflective Optical System for Freeform Surfaces under Manufacturing Constraints

Yiwei Sun1, Yangjie Wei1、*, Sike Chen1, and Ji Zhao2
Author Affiliations
  • 1College of Computer Science and Engineering, Northeastern University, Shenyang 110819, Liaoning , China
  • 2College of Mechanical Engineering and Automation, Northeastern University, Shenyang 110819, Liaoning , China
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    AbstractGet PDF(in Chinese)
    Figures&Tables (15)
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    References (38)
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    Figures & Tables(15)
    Schematic diagram of the improved W-W method

    Fig. 1. Schematic diagram of the improved W-W method

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    Flow chart of the design process

    Fig. 2. Flow chart of the design process

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    Positional relationship between the mirrors and the reference surface during the machining process

    Fig. 3. Positional relationship between the mirrors and the reference surface during the machining process

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    Three types of obscurations. (a) No obscuration occurs; (b) partial optical path between M1 and M2 is obstructed by M3; (c) the optical path between M1 and M2 is totally obstructed by M3

    Fig. 4. Three types of obscurations. (a) No obscuration occurs; (b) partial optical path between M1 and M2 is obstructed by M3; (c) the optical path between M1 and M2 is totally obstructed by M3

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    Process of generating the design starting point of the system. (a) Error function during the searching process; (b) layout of the freeform off-axis three-mirror system

    Fig. 5. Process of generating the design starting point of the system. (a) Error function during the searching process; (b) layout of the freeform off-axis three-mirror system

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    Value of error functions of the designed system by the proposed method and improved W-W method. (a) Value of co-circularity error; (b) value of obscuration error; (c) value of manufacturing error

    Fig. 6. Value of error functions of the designed system by the proposed method and improved W-W method. (a) Value of co-circularity error; (b) value of obscuration error; (c) value of manufacturing error

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    Imaging performance of the designed system by the proposed method and improved W-W method. (a) RMS wavefront error; (b) RMS spot radius

    Fig. 7. Imaging performance of the designed system by the proposed method and improved W-W method. (a) RMS wavefront error; (b) RMS spot radius

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    Design results for the optimized system. (a) Layout of the optimized system; (b) MTF curves of the optimized system; (c) spot diagrams of the optimized system; (d) field curvature and distortion of the optimized system

    Fig. 8. Design results for the optimized system. (a) Layout of the optimized system; (b) MTF curves of the optimized system; (c) spot diagrams of the optimized system; (d) field curvature and distortion of the optimized system

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    Process of generating the design starting point of the system. (a) Error function during the searching process; (b) layout of the freeform off-axis three-mirror system

    Fig. 9. Process of generating the design starting point of the system. (a) Error function during the searching process; (b) layout of the freeform off-axis three-mirror system

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    Comparison of the designed system by the proposed method and improved W-W method. (a) Value of manufacturing error; (b) RMS wavefront error; (c) RMS spot radius

    Fig. 10. Comparison of the designed system by the proposed method and improved W-W method. (a) Value of manufacturing error; (b) RMS wavefront error; (c) RMS spot radius

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    Design results for the optimized system. (a) Layout of the optimized system; (b) MTF curve the optimized system; (c) spot diagram of the optimized system; (d) field curvature and distortion of the optimized system

    Fig. 11. Design results for the optimized system. (a) Layout of the optimized system; (b) MTF curve the optimized system; (c) spot diagram of the optimized system; (d) field curvature and distortion of the optimized system

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    • Table 1. Specifications of the "heterolateral imaging" off-axis three-mirror system

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      Table 1. Specifications of the "heterolateral imaging" off-axis three-mirror system

      ParameterSpecification
      Entrance pupil diameter90 mm
      F-number3.3
      Field of view4°×4°
      Work spectrum380-780 nm
      Detector pixel size20 µm

    • Table 2. Range of structural parameters and the final search value of the system in the search process

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      Table 2. Range of structural parameters and the final search value of the system in the search process

      VariableLower bandUpper bandResult
      α1/（°）104023.30
      α2/（°）408066.63
      α3/（°）80120103.56
      r1/mm-500-160-448.91
      r2/mm160500367.03
      r3/mm-500-160-353.66
      d1/mm-400-200-272.10
      d2/mm200400281.11
      d3/mm-400-200-318.83

    • Table 3. Specifications of the "ipsilateral imaging" off-axis three-mirror system

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      Table 3. Specifications of the "ipsilateral imaging" off-axis three-mirror system

      ParameterSpecification
      Entrance pupil diameter85 mm
      F-number3.5
      Field of view2°×2°
      Work spectrum380-780 nm
      Detector pixel size20 µm

    • Table 4. Range of structural parameters and the final search value of the system in the search process

      View table

      Table 4. Range of structural parameters and the final search value of the system in the search process

      VariableLower bandUpper bandResult
      α1/（°）53014.651
      α2/（°）206042.710
      α3/（°）206050.790
      r1/mm-500-160-388.550
      r2/mm160500413.800
      r3/mm-500-160-403.400
      d1/mm-400-200-275.720
      d2/mm200400295.580
      d3/mm-400-200-357.420
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    Yiwei Sun, Yangjie Wei, Sike Chen, Ji Zhao. Design Method of Off-Axis Reflective Optical System for Freeform Surfaces under Manufacturing Constraints[J]. Acta Optica Sinica, 2024, 44(3): 0322003

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Jul. 3, 2023

    Accepted: Oct. 21, 2023

    Published Online: Feb. 21, 2024

    The Author Email: Wei Yangjie (weiyangjie@cse.neu.edu.cn)

    DOI:10.3788/AOS231221

    CSTR:32393.14.AOS231221

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology