[1] [1] David L. Windt, Webster C. Cash, M. Scott et al.. Optical constants for thin films of C, diamond, Al, Si, and CVD SiC from 24  to 1216 [J]. Appl. Opt., 1988, 27(2): 279～295

[2] [2] W. R. Hunter. Measurement of optical properties of materials in the vacuum ultraviolet spectral region[J]. Appl. Opt., 1982, 21(12): 2103～2114

[3] [3] D. W. Juenker, L. J. Leblanc, C. R. Martin. Optical properties of some transition metals[J]. J. Opt. Soc. Am., 1968, 58(2): 164～171

[4] [4] Krnnetch A. Kress, Gkrald J. Lapeyre. Optical properties of molybdenum and ruthenium[J]. J. Opt. Soc. Am., 1970, 60(12): 1681～1684

[5] [5] H. Hass, G. F. Jacobus, W. R. Hunter. Optical properties of evaporated iridium in the vacuum ultraviolet from 500 Angstroms to 2000 Angstroms[J]. J. Opt. Soc. Am., 1967, 57(6): 758～762

[6] [6] J. T. Cox, G. Hass, J. B. Ramsey et al.. Reflectance of evaporated rhenium and tungsten films in the vacuum ultraviolet from 300 to 2000[J]. J. Opt. Soc. Am., 1972, 62(6): 781～785

[7] [7] C. J. Powell. Analysis of optical- and inelastic-electron-scattering data. Ⅲ. reflectance data for beryllium, germanium, antimony, and bismuth[J]. J. Opt. Soc. Am., 1970, 60(2): 214～220

[8] [8] J. T. Cox, G. Hass, J. B. Ramsey et al.. Reflectance and optical constants of evaporated osmium in the vacuum ultraviolet from 300 to 2000 A[J]. J. Opt. Soc. Am., 1973, 63(4): 435～442

[9] [9] David L. Windt, Webster C. Cash, M. Scott et al.. Optical constants for thin films of Ti, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Hf, Ta, W, Re, Ir, Os, Pt, and Au from 24 A to 1216 A[J]. Appl. Opt., 1988, 27(2): 246～278

[10] [10] Robert La Villa, H. Mendlowitz. Optical constants of aluminum in vacuum ultraviolet[J]. Phys. Rev. Lett.. 1962, 9(4): 149～150

[11] [11] R. B. Gillette, B. A. Kenyon. Proton-induced contaminant film effects on uv reflecting mirrors[J]. Appl. Opt., 1971, 10(3): 545～551

[12] [12] Ritva A. M. Keski-Kuha, Charles M. Fleetwood, Joseph Robichaud. Performance of high-density cast silicon carbide in the extreme ultraviolet[J]. Appl. Opt., 1997, 36(19): 4409～4410

[13] [13] Ritva A. M. Keski-Kuha, Joseph Osantowski, H. Herzig et al.. Normal incidence reflectance of ion beam deposited SiC films in the EUV[J]. Appl. Opt., 1988, 27: 2815～2816

[14] [14] G. M. Blumenstock, Ritva A. M. Keski-Kuha. Ion-beam-deposited boron carbide coatings for the extreme ultraviolet[J]. Appl. Opt., 1994, 33(25): 5962～5963

[15] [15] Juan I. Larruquert, Ritva A. M. Keski-Kuha. Multilayer coatings with high reflectance in the extreme ultraviolet spectral range of 50 to 121.6 nm[J]. Appl. Opt., 1999, 38(7): 1231～1236

[16] [16] J. B. Kortright, David L. Windt. Amorphous silicon carbide coatings for extreme ultraviolet optics[J]. Appl. Opt., 1988, 27(14): 2841～2846

[17] [17] Juan I. Larruquert, Ritva A. M. Keski-Kuha. Optical properties of hot-pressed B4C in the extreme ultraviolet[J]. Appl. Opt., 2000, 39(10): 1537～1540

[21] [21] M. Born, E. Wolf. Principles of Optics[M]. (7th edition), England: Cambridge university press, 1999. 735～790

[25] [25] Alert Thompson, Ingoif Lindau, David Attwood et al.. X-Ray Data Booklet[M]. California: Lawrence Berkeley National Laboratory, 1986. 5-17～24