Comparison of high-energy multi-pass Ti:sapphire amplifiers with a different Ti-dopant concentration

Zebiao Gan; Xiaoyan Liang; Lianghong Yu; Jiaqi Hong; Ming Xu; Ying Hang; Ruxin Li

doi:10.3788/COL201715.091401

Chinese Optics Letters, Volume. 15, Issue 9, 091401(2017)

Comparison of high-energy multi-pass Ti:sapphire amplifiers with a different Ti-dopant concentration

Zebiao Gan^1,2, Xiaoyan Liang^1、*, Lianghong Yu¹, Jiaqi Hong^2,3, Ming Xu³, Ying Hang³, and Ruxin Li¹

¹State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²University of Chinese Academy of Sciences, Chinese Academy of Sciences, Beijing, 100049, China

³Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

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Zebiao Gan, Xiaoyan Liang, Lianghong Yu, Jiaqi Hong, Ming Xu, Ying Hang, Ruxin Li, "Comparison of high-energy multi-pass Ti:sapphire amplifiers with a different Ti-dopant concentration," Chin. Opt. Lett. 15, 091401 (2017)

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Paper Information

Category: Lasers and Laser Optics

Received: Feb. 23, 2017

Accepted: May. 25, 2017

Published Online: Jul. 19, 2018

The Author Email: Xiaoyan Liang (liangxy@siom.ac.cn)

DOI:10.3788/COL201715.091401

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology