Journal of Semiconductors, Volume. 44, Issue 6, 062803(2023)
Rapid epitaxy of 2-inch and high-quality α-Ga2O3 films by mist-CVD method
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Xiaojie Wang, Wenxiang Mu, Jiahui Xie, Jinteng Zhang, Yang Li, Zhitai Jia, Xutang Tao. Rapid epitaxy of 2-inch and high-quality α-Ga2O3 films by mist-CVD method[J]. Journal of Semiconductors, 2023, 44(6): 062803
Category: Articles
Received: Jan. 30, 2023
Accepted: --
Published Online: Jul. 6, 2023
The Author Email: Wenxiang Mu (mwx@sdu.edu.cn), Yang Li (yangli@sdu.edu.cn)