The mulDamage characteristics of HfO<sub>2</sub>/SiO<sub>2</sub> high reflector at 45° incidence in 1-on-1 and N-on-1 tests

Xiaofeng Liu; Dawei Li; Yuan'an Zhao; Xiao Li; Xiulan Ling; Jianda Shao

doi:10.3788/COL20100801.0041

Chinese Optics Letters, Volume. 8, Issue 1, 41(2010)

The mulDamage characteristics of HfO₂/SiO₂ high reflector at 45° incidence in 1-on-1 and N-on-1 tests

Xiaofeng Liu^1,2, Dawei Li¹, Yuan'an Zhao¹, Xiao Li^1,2, Xiulan Ling^1,2, and Jianda Shao¹

Author Affiliations

¹Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Graduate School of the Chinese Academy of Sciences, Beijing 100049, China

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Xiaofeng Liu, Dawei Li, Yuan'an Zhao, Xiao Li, Xiulan Ling, Jianda Shao, "The mulDamage characteristics of HfO₂/SiO₂ high reflector at 45° incidence in 1-on-1 and N-on-1 tests," Chin. Opt. Lett. 8, 41 (2010)

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Paper Information

Received: Feb. 26, 2009

Accepted: --

Published Online: Mar. 1, 2010

The Author Email:

DOI:10.3788/COL20100801.0041

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology