Optoelectronic Technology, Volume. 41, Issue 1, 70(2021)
Research Progress of a⁃IGZO TFT Based on Dual⁃active Layer
The research progress of a-IGZO was reviewed , as well as the high stability mechanism, preparation process, the element ratio between two layers, adulteration method and process parameters. In addition, the effect of dual-active layer on TFT's properties and the improved methods were comprehensively and thoroughly analyzed. Then, the future direction of a-IGZO technology was prospected.
Get Citation
Copy Citation Text
Yanmei LUO, Zhoushuo CHU, Jian WANG, Ke HU, Botao SUN. Research Progress of a⁃IGZO TFT Based on Dual⁃active Layer[J]. Optoelectronic Technology, 2021, 41(1): 70
Category: Study Report
Received: Oct. 9, 2020
Accepted: --
Published Online: Jul. 14, 2021
The Author Email: