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Optics and Precision Engineering, Volume. 19, Issue 7, 1437(2011)

Measurement of large aperture SiC flat mirrors by oblique incidence interferometry

LIU Zhao-dong1、*, CHEN Lei1, HAN Zhi-gang1, YAN Qing-wei2, and ZHU Ri-hong1
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    LIU Zhao-dong, CHEN Lei, HAN Zhi-gang, YAN Qing-wei, ZHU Ri-hong. Measurement of large aperture SiC flat mirrors by oblique incidence interferometry[J]. Optics and Precision Engineering, 2011, 19(7): 1437

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    Received: Sep. 13, 2010

    Accepted: --

    Published Online: Aug. 15, 2011

    The Author Email: LIU Zhao-dong (liuzhaodong6@hotmail.com)

    DOI:10.3788/ope.20111907.1437

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology