Acta Optica Sinica, Volume. 19, Issue 11, 1512(1999)

Research on Phenomenon of the Super-Resolution in Laser Lithography

[in Chinese], [in Chinese], and [in Chinese]
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    References(2)

    [2] [2] Charrier E W, Mack C A. Yielding modeling and enhancement for optical lithography. Proc. SPIE, 1995, 2440:435~447

    [3] [3] Bernard D A, Urbach H P. Thin-film interference effects in photolithography for finite numerical aperture. J. Opt. Soc. Am. (A), 1991, 8(1):123~133

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    [in Chinese], [in Chinese], [in Chinese]. Research on Phenomenon of the Super-Resolution in Laser Lithography[J]. Acta Optica Sinica, 1999, 19(11): 1512

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Jul. 13, 1998

    Accepted: --

    Published Online: Aug. 9, 2006

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