Narrow vertical beam divergence angle for display applications of 645 nm lasers

Yufei Jia; Yufei Wang; Xuyan Zhou; Linhai Xu; Pijie Ma; Jingxuan Chen; Hongwei Qu; Wanhua Zheng

doi:10.3788/COL202119.101401

Chinese Optics Letters, Volume. 19, Issue 10, 101401(2021)

Narrow vertical beam divergence angle for display applications of 645 nm lasers

Yufei Jia^1,2, Yufei Wang^1,3, Xuyan Zhou¹, Linhai Xu^1,2, Pijie Ma^1,3, Jingxuan Chen^1,2, Hongwei Qu¹, and Wanhua Zheng^1,2,3,4、*

Author Affiliations

¹Laboratory of Solid State Optoelectronics Information Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

³College of Future Technology, University of Chinese Academy of Sciences, Beijing 101408, China

⁴State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China

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Yufei Jia, Yufei Wang, Xuyan Zhou, Linhai Xu, Pijie Ma, Jingxuan Chen, Hongwei Qu, Wanhua Zheng, "Narrow vertical beam divergence angle for display applications of 645 nm lasers," Chin. Opt. Lett. 19, 101401 (2021)

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Paper Information

Category: Lasers, Optical Amplifiers, and Laser Optics

Received: Jan. 21, 2021

Accepted: Mar. 9, 2021

Published Online: Oct. 18, 2021

The Author Email: Wanhua Zheng (whzheng@semi.ac.cn)

DOI:10.3788/COL202119.101401

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology