Fig. 1. Schematic illustration for Chemical vapor deposition in situ co-growth of cobalt-doped MoSe₂.

Fig. 2. OM of Co-doped MoSe₂ under different H₂ flow rates.

Fig. 3. Topographic measurements under different H₂ flow rates: (a)−(d) Topography; (e)−(h) profile line along the red dash line.

Fig. 4. (a) EDS spectrum of doped Co MoSe₂; (b) EDS mapping of Co doped MoSe₂; (c−e) XPS contrast spectra of MoSe₂ and cobalt-doped MoSe₂: (c) Co2p core level region, (d) Mo3d core level region and (e) Se3d core level region, respectively.

Fig. 5. (a) Raman and (b) PL spectra of MoSe₂ and Co-doped MoSe₂; (c) raman mapping of MoSe₂ (238 cm^–1); (d) raman mapping Co-doped MoSe₂ (235 cm^–1).

Fig. 6. VSM of (a) MoSe₂ and (b) Co doped MoSe₂ with different Co₃O₄ use level.

Fig. 7. Typical transfer characteristics of (a) undoped MoSe₂ and (b) Co doped MoSe₂ FETs device with semilog scale.