Chinese Optics Letters, Volume. 15, Issue 6, 062201(2017)

Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography

Yonghui Zhang1,2, Zihui Zhang1,2, Chong Geng1,2, Shu Xu1,2, Tongbo Wei3、*, and Wen'gang Bi1,2
Author Affiliations
  • 1Institute of Micro-Nano Photoelectron and Electromagnetic Technology Innovation, School of Electronics and Information Engineering, Hebei University of Technology, Tianjin 300401, China
  • 2Key Laboratory of Electronic Materials and Devices of Tianjin, Tianjin 300401, China
  • 3Semiconductor Lighting Technology Research and Development Center, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
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    References(28)

    [1] Z. Dai, Y. Li, G. Duan, L. Jia, W. Cai. Acsnano, 6, 6706(2012).

    [7] B. Ni, L. Huang, J. Ding, G. Li, X. Chen, W. Lu. Opt. Commun., 237, 298(2013).

    [18] S. Cataldo, J. Zhao, F. Neubrech, B. Frank, C. Zhang, P. V. Braun, H. Giessen. Acsnano, 6, 979(2012).

    CLP Journals

    [1] Huijuan Xia, Shumin Yang, Liansheng Wang, Jun Zhao, Chaofan Xue, Yanqing Wu, Renzhong Tai, "Nonuniform self-imaging of achromatic Talbot lithography," Chin. Opt. Lett. 17, 062201 (2019)

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    Yonghui Zhang, Zihui Zhang, Chong Geng, Shu Xu, Tongbo Wei, Wen'gang Bi, "Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography," Chin. Opt. Lett. 15, 062201 (2017)

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Jan. 23, 2017

    Accepted: Feb. 17, 2017

    Published Online: Jul. 20, 2018

    The Author Email: Tongbo Wei (tbwei@semi.ac.cn)

    DOI:10.3788/COL201715.062201

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