Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

APPLIED LASER, Volume. 41, Issue 6, 1293(2021)

Analysis of Typical Pollution Temperature Field and Stress Field Under Different Distribution Characteristics of Pulsed Laser

Wang Yiqing1,2、*, Fang Chunhua1,2, Sun Wei1,2, Pu Ziheng1,2, Hou Zhengyu1,2, Yuan Tian3, Wu Tian1,2, Li Peng1,2, and Zhu Yuhan1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
    • show less
    AbstractGet PDF(in Chinese)
    Figures&Tables (0)
    Equations (0)
    References (2)
    Tools
    Paper Information
    Topics
    References(2)

    [13] [13] WANG X L, WANG H, XU X R, et al. A new method to remove the aging RTV coatings on glass insulators［C］//2016 IEEE International Conference on Dielectrics. Montpellier: IEEE, 2016: 709-711.

    [17] [17] BARREIRO P, GONZLEZ P, POZO-ANTONIO J S. IR irradiation to remove a sub-aerial biofilm from granitic stones using two different laser systems: An Nd: YAG (1 064 nm) and an Er: YAG (2 940 nm)［J］. Science of the Total Environment, 2019, 688: 632-641.

    Tools

    Get Citation

    Copy Citation Text

    Wang Yiqing, Fang Chunhua, Sun Wei, Pu Ziheng, Hou Zhengyu, Yuan Tian, Wu Tian, Li Peng, Zhu Yuhan. Analysis of Typical Pollution Temperature Field and Stress Field Under Different Distribution Characteristics of Pulsed Laser[J]. APPLIED LASER, 2021, 41(6): 1293

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Received: Dec. 11, 2020

    Accepted: --

    Published Online: Feb. 17, 2022

    The Author Email: Wang Yiqing (1404663218@qq.com)

    DOI:10.14128/j.cnki.al.20214106.1293

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology