Stress Birefringence Analysis in Fused Silica at Deep Ultraviolet Waveband Based on Finite Element Simulation Method

Zhifan Liu; Yanmin Cai; Yang Bu; Jianhua Zhang; Xiangzhao Wang

doi:10.3788/AOS202141.1226001

Acta Optica Sinica, Volume. 41, Issue 12, 1226001(2021)

Stress Birefringence Analysis in Fused Silica at Deep Ultraviolet Waveband Based on Finite Element Simulation Method

Zhifan Liu¹, Yanmin Cai², Yang Bu^2、*, Jianhua Zhang¹, and Xiangzhao Wang²

Author Affiliations

¹School of Mechatronic Engineering and Automation, Shanghai University, Shanghai 200444, China

²Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

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Figures & Tables(8)

$Schematic of three coordinate systems. (a) System coordinate; (b) refraction coordinate; (c) stress coordinate$

Fig. 1. Schematic of three coordinate systems. (a) System coordinate; (b) refraction coordinate; (c) stress coordinate

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Fig. 2. Stress components coloring contours. (a) Normal stress σ_x; (b) normal stress σ_y; (c) shear stress τ_xy

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Fig. 3. Stress birefringence simulation results at 632.8 nm wavelength

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Fig. 4. Wavefront map of exit pupil at 632.8 nm wavelength

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Fig. 5. Measuring results of stress birefringence at 632.8 nm wavelength

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Fig. 6. Simulation result of stress birefringence at 248 nm wavelength

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Fig. 7. Simulation result of stress birefringence at 193 nm wavelength

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Table 1. Runtime analysis results of the two stress birefringence analysis methodsunit: s
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Table 1. Runtime analysis results of the two stress birefringence analysis methodsunit: s
Method Finite element with ray tracing method Proposed method
Finite element meshing 343 260
Ray tracing 15 /
Post calculation / 21
Total time 358 281

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Zhifan Liu, Yanmin Cai, Yang Bu, Jianhua Zhang, Xiangzhao Wang. Stress Birefringence Analysis in Fused Silica at Deep Ultraviolet Waveband Based on Finite Element Simulation Method[J]. Acta Optica Sinica, 2021, 41(12): 1226001

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