The substrate temperature is an important factor which affect the character of ZnO thin film and to a great extend, it can change the structure of crystallization of the thin film. The temperature can directly affect the transfer rate of the surface atom of the substrate, reraporize and crystallization. Under the indoor temperature, the XRD curve of the ZnO thin film was measured which grow in the different temperature and the best substrate temperature for the best quality of crystallization was probed From the temperature curve of the transfer rate, the same result was also got.