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Chinese Journal of Lasers, Volume. 14, Issue 11, 671(1987)

Diagnosis of kinetic process in silane LPCVD by means of OLD

Fu Guangsheng, Li Xiaowei, Han Li, Zhang Lianshui, Dong Lifang, Lu Furun, and Xue Chunyin
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    The shock wave in SiH4 laser plasma chemical vapour deposition (LPCVD) are measured byoptoacoustic laser deflection (OLD) technique. The result shows that the shock wars induced by laser gas breakdown is the basic gaa kinetic process in LPGVD. Also discussed is its influence on thin film growth.

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    Fu Guangsheng, Li Xiaowei, Han Li, Zhang Lianshui, Dong Lifang, Lu Furun, Xue Chunyin. Diagnosis of kinetic process in silane LPCVD by means of OLD[J]. Chinese Journal of Lasers, 1987, 14(11): 671

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    Paper Information

    Category: laser devices and laser physics

    Received: Sep. 1, 1986

    Accepted: --

    Published Online: Aug. 10, 2012

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology