Chinese Optics, Volume. 17, Issue 2, 334(2024)

Development of high-precision beam splitter for inter-satellite communication system

Zhen-yu WANG1,2, Xiu-hua FU1,2、*, Zhao-wen LIN2,3, Jian-shan HUANG3, Yu-jun WEI1,2, Gui-qing WU3, Yong-gang PAN2,3, Suo-tao DONG2, and Ben WANG2,3
Author Affiliations
  • 1School of Optoelectronic Engineering, Changchun University of Science and Technology, Changchun 130022, China
  • 2Zhongshan Institute of Changchun University of Science and Technology, Zhongshan 528437, China
  • 3Zhongshan Jilion Optoelectronics Technology Co., Ltd., Zhongshan 528437, China
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    Figures & Tables(18)
    Theoretical spectra transmittance curve of the splitter film
    Double sided theoretical spectra transmittance curve of the beam splitter mirror
    Thin film stress maps. (a) Tensile stress; (b) compressive stress
    Schematic diagram of reflection wavefront of the substrate
    Schematic diagram of the Power and curvature radius of the substrate
    Transmittance test curve and fitting curve of the splitter film
    Power spectral densities of 4 samples
    Transmittance curves of 4 samples
    Fitting curve for the change in sample power with the thickness of deposited SiO2
    Power spectrum density of beam splitter mirror
    Transmittance curves of beam splitter mirror
    • Table 1. Material deposition process parameters

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      Table 1. Material deposition process parameters

      材料沉积速率/(nm·s−1)起始真空度/(×10−4 Pa)沉积温度/(°C)
      Ta2O50.47220
      SiO20.67220
    • Table 2. \begin{document}$\Delta $\end{document}power of the sample corresponding to different process parameters of ion source

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      Table 2. \begin{document}$\Delta $\end{document}power of the sample corresponding to different process parameters of ion source

      编号电压/V束流/mA面形图∆power(λ)
      基底沉积后
      11 1009500.148 5
      21 0009200.160 2
      39509000.182 1
    • Table 3. Process parameters of ion source

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      Table 3. Process parameters of ion source

      材料电压/V束流/mA气体 O2/Sccm气体 Ar/Sccm
      Ta2O51 100950508
      SiO2(直控)1 100950508
      SiO2(背反)950900508
      SiO2(晶控)950900508
    • Table 4. Surface shape results of sample deposited beam splitter

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      Table 4. Surface shape results of sample deposited beam splitter

      类别编号1#2#3#4#
      基底面形图
      PV(λ)0.074 60.076 10.077 40.072 3
      RMS(λ)0.008 70.009 20.009 70.008 3
      Power(λ)0.007 30.008 10.008 40.007 8
      沉积后面形
      PV(λ)0.516 70.528 90.531 60.515 3
      RMS(λ)0.111 80.111 60.111 40.111 9
      Power(λ)−0.385 9−0.383 9−0.382 7−0.3854
    • Table 5. Data on the variation of sample Power and A-values with different thicknesses of deposited SiO2 film

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      Table 5. Data on the variation of sample Power and A-values with different thicknesses of deposited SiO2 film

      SiO2厚度(nm)∆Power(λ)A(∆λ/100 nm SiO2)
      3 5000.155 10.004 43
      5 0000.228 00.004 56
      6 5000.308 80.004 75
      8 0000.394 40.004 93
      9 5000.488 30.005 14
    • Table 6. Surface parameters of samples before and after correction

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      Table 6. Surface parameters of samples before and after correction

      类别面形图PV(λ)RMS(λ)Power(λ)
      修正前0.531 60.111 4−0.382 7
      修正后0.121 90.016 2−0.042 9
    • Table 7. Surface parameters and surface profile before and after correction

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      Table 7. Surface parameters and surface profile before and after correction

      类别面形图PV(λ)RMS(λ)Power(λ)
      基底0.07230.00830.0078
      修正前( 反射面形)0.51530.1119−0.3854
      修正后(反射面形)0.08880.0107−0.0153
      修正前(透过面形)0.06940.00970.0136
      修正后(透过面形)0.07830.01030.0141
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    Zhen-yu WANG, Xiu-hua FU, Zhao-wen LIN, Jian-shan HUANG, Yu-jun WEI, Gui-qing WU, Yong-gang PAN, Suo-tao DONG, Ben WANG. Development of high-precision beam splitter for inter-satellite communication system[J]. Chinese Optics, 2024, 17(2): 334

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    Paper Information

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    Received: Jun. 9, 2023

    Accepted: --

    Published Online: Apr. 15, 2024

    The Author Email:

    DOI:10.37188/CO.2023-0100

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