Fig. 1. Theoretical design of spectral curve of visible light anti-reflectance film

Fig. 2. Simulation results of effect of error on spectrum

Fig. 3. Effect of oxygen charging rate on performance of TiO₂ material

Fig. 4. Effect of temperature and IBS parameters on TiO₂

Fig. 5. Effect of substrate temperature on MgF₂ film

Fig. 6. Deposition thickness analysis of TiO₂ and SiO₂ materials in evaporation rise stage

Fig. 7. Residual evaporation analysis of TiO₂ and SiO₂ materials

Fig. 8. Formula curves of film thickness error control model

Fig. 9. Comparison of spectral curves before and after using mathematical models

Fig. 10. Optimization of film thickness of sensitive layers

Fig. 11. Hardness test result

Fig. 12. Effect of IBS parameters on MgF₂ film

Fig. 13. Result of boiling test

Fig. 14. Result of boiling test after adding SiO₂ protective layer on outermost layer

Fig. 15. Repeatability test result