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Chinese Journal of Lasers, Volume. 41, Issue 10, 1007002(2014)

Influence of Substrate Temperature on SiO2 Thin Films by Electron Beam Deposition

Du Qianqian1,2、*, Wang Wenjun1,2, Li Shuhong1,2, Liu Yunlong1,2, He Xiaoxiao1,2, Gao Xuexi1,2, Zhang Bingyuan1,2, and Shi Qiang1,2
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    Du Qianqian, Wang Wenjun, Li Shuhong, Liu Yunlong, He Xiaoxiao, Gao Xuexi, Zhang Bingyuan, Shi Qiang. Influence of Substrate Temperature on SiO2 Thin Films by Electron Beam Deposition[J]. Chinese Journal of Lasers, 2014, 41(10): 1007002

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    Paper Information

    Category: holography and information processing

    Received: Apr. 30, 2014

    Accepted: --

    Published Online: Aug. 15, 2014

    The Author Email: Du Qianqian (dzdq0126@163.com)

    DOI:10.3788/cjl201441.1007002

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology