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Acta Optica Sinica, Volume. 32, Issue 6, 607001(2012)

Theoretical Analysis of Photolithography Alignment and Calibration Method Based on Moiré Fringes

Zhu Jiangping1,2,3、*, Hu Song1, Yu Junsheng2, Tang Yan1, and Zhou Shaolin1
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    Article index updated: Mar. 10, 2025

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    Zhu Jiangping, Hu Song, Yu Junsheng, Tang Yan, Zhou Shaolin. Theoretical Analysis of Photolithography Alignment and Calibration Method Based on Moiré Fringes[J]. Acta Optica Sinica, 2012, 32(6): 607001

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    Paper Information

    Category: Fourier optics and signal processing

    Received: Nov. 29, 2011

    Accepted: --

    Published Online: May. 4, 2012

    The Author Email: Jiangping Zhu (zsyioe@163.com)

    DOI:10.3788/aos201232.0607001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology