Vanadium oxide (VOx) films are deposited by radio frequency (RF) magnetron sputtering. Effects of sputtering powers on structure, optical and mechanical properties of the vanadium oxide films are investigated. Deposition rate, crystalline structure, surface morphology are measured by the profiler, X- ray diffraction, and scanning electron microscopy, respectively. The spectrophotometer, ellipsometer and nano-indenter are employed to test the optical properties such as transmittance, reflective index, absorption, mechanical properties of hardness and elastic modulus. The results show that all of the film samples are transparent with transmittance of more than 80% within the optical range. The deposition rate, hardness and refractive indices within the visible range monotonously increase with increasing sputtering power. While surface roughness of the films increases firstly and then decreases with increasing sputtering power. It is found that the sputtering power has influence on the crystalline structure as well.