Aiming to manufacture high output power of high reflective mirror, the influence of O2 ion-beam assistance and annealing treatment to ZrO2 films and ZrO2/SiO2 high reflection films used for 441.6 nm He-Cd laser is studied. The effects of different deposition processes and post-treatment on the optical and roughness of the samples are characterized by ultraviolet-visible spectrophotometer and atomic force microscopy, respectively. The results show that O2 ion-beam assisted deposition increases the reflectivity and form a dense film structure, but the output power of laser is smaller due to the introduction of impurity defects to improve the absorption rate of film; the output power of annealed films has been improved significantly than films without annealing while impurity gas and water on film surface are eliminated.