Fig. 1. Morphology of different damage types^[10]

Fig. 2. (a)～(c):Ejection distribution on the collector; (d)～(g): typical SEM images of the collected particles^[18]

Fig. 3. Molecular dynamics simulation of shock-induced ejection on silica surface

Fig. 4. Absorption mapping images of three kinds of samples^[27]

Fig. 5. Obscurations growth vs shot number of damage site^[8]

Fig. 6. Damage probability and damage density of fused silica etched different times^[48]

Fig. 7. Morphology of mitigated damage sites with different laser parameters

Fig. 8. Basic structure of a V-type beam dump^[57]

Fig. 9. Damage initiation probability versus laser fluence at 355 nm, 5 ns for the virgin sample and the samples treated with different processes^[60]

Fig. 10. Laser damage growth of an unetched site (site 1) and an etched site (site 2) on a same optics after flat-top-shaped ultraviolet laser irradiation with the wavelength of 351 nm, the duration of 5.0 ns and the fluence of 8.0 J/cm². The Site 2 is etched 24.0 h by using HF-based solution^[63]