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Acta Physica Sinica, Volume. 69, Issue 3, 030601-1(2020)

Influence of incident illumination on optical scattering measurement of typical photoresist nanostructure

Zheng-Qiong Dong1... Hang Zhao1, Jin-Long Zhu2 and Ya-Ting Shi2,* |Show fewer author(s)
Author Affiliations
  • 1Hubei Key Laboratory of Manufacture Quality Engineering, Hubei University of Technology, Wuhan 430068, China
  • 2State Key Laboratory for Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, China
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    Zheng-Qiong Dong, Hang Zhao, Jin-Long Zhu, Ya-Ting Shi. Influence of incident illumination on optical scattering measurement of typical photoresist nanostructure[J]. Acta Physica Sinica, 2020, 69(3): 030601-1

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    Paper Information

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    Received: Oct. 8, 2019

    Accepted: --

    Published Online: Nov. 10, 2020

    The Author Email:

    DOI:10.7498/aps.69.20191525

    Topics

    Nuclear physics
    Particles and fields
    Particle and nuclear astrophysics and cosmology