High-efficiency multi-wavelength metasurface with complete independent phase control

Jing Yan; Yinghui Guo; Mingbo Pu; Xiong Li; Xiaoliang Ma; Xiangang Luo

doi:10.3788/COL201816.050003

Chinese Optics Letters, Volume. 16, Issue 5, 050003(2018)

High-efficiency multi-wavelength metasurface with complete independent phase control

Jing Yan^1,2, Yinghui Guo^1,2, Mingbo Pu^1,2, Xiong Li^1,2, Xiaoliang Ma^1,2, and Xiangang Luo^1,2、*

¹State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China

²University of Chinese Academy of Sciences, Beijing 100049, China

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Figures & Tables(7)

Fig. 1. Schematic of unit cell for the proposed metasurface. Left panel: 3D view of the basic element used in the simulation. Right panel: view of the top and bottom metallic layer (top panel) as well as the middle metallic layer (bottom panel).

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Fig. 2. Simulated results of the twelve-level unit cells. (a) and (c) illustrate the phase response and transmission amplitude at 10 GHz under y-polarized incidence, respectively. (b) and (d) illustrate the phase response and transmission amplitude at 20 GHz under x-polarized incidence, respectively. (e) The polarization conversion ratio at 10 GHz under y-polarized incidence. (f) The polarization conversion ratio at 20 GHz under x-polarized incidence.

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Fig. 3. (a) illustrates the transmission amplitude at 10 GHz under x-polarized incidence. (b) illustrates the transmission amplitude at 20 GHz under y-polarized incidence.

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Fig. 4. Simulated results of generated OAM. (a) and (b) illustrate the phase distribution for 10 and 20 GHz, respectively. (c) and (e) illustrate the intensity pattern and phase pattern of the electric-field distributions at the position of z = 50 mm under 10 GHz, respectively. (d) and (f) illustrate the intensity pattern and phase pattern of the electric-field distributions in near-field under 20 GHz at the position of z = 50 mm, respectively.

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Fig. 5. Simulated results of deflector. (a) and (c) illustrate the simulated y component and x component of electric-field distribution under the x-polarized normal incidence at 20 GHz, respectively. (b) and (d) illustrate the simulated y component and x component of electric-field distribution under the x-polarized normal incidence at 20 GHz, respectively. (e) and (f) illustrate 3D far-field patterns under the x-polarized normal incidence at 10 and 20 GHz, respectively.

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Fig. 6. Simulated results of the deflector. (a) illustrates the phase shift under the x-polarized normal incidence from 18 to 24 GHz, and the curves of different colors correspond to the different cells. (b) illustrates the phase shift under the y-polarized normal incidence from 9 to 11 GHz. (c) and (e) illustrate the simulated y component of electric-field distribution under the x-polarized normal incidence at 19 and 24 GHz. (d) and (f) illustrate the simulated x component of electric-field distribution under the y-polarized normal incidence at 9 and 11 GHz.

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Table 1. Opening Angle and Orientation of the Unit Cell

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Table 1. Opening Angle and Orientation of the Unit Cell

Variation of CSSRR	$α_{2}$ (°)	$θ_{2}$ (°)	Variation of CSRR	$α_{1}$ (°)	$θ_{1}$ (°)
1	165	$- 135$	1	200	$- 135$
2	150	$- 135$	2	180	$- 135$
3	120	$- 135$	3	155	$- 135$
4	85	$- 135$	4	120	$- 135$
5	45	$- 135$	5	85	$- 135$
6	10	$- 135$	6	55	$- 135$
7	165	$- 45$	7	200	$- 45$
8	150	$- 45$	8	180	$- 45$
9	120	$- 45$	9	155	$- 45$
10	85	$- 45$	10	120	$- 45$
11	45	$- 45$	11	85	$- 45$
12	10	$- 45$	12	55	$- 45$

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Jing Yan, Yinghui Guo, Mingbo Pu, Xiong Li, Xiaoliang Ma, Xiangang Luo, "High-efficiency multi-wavelength metasurface with complete independent phase control," Chin. Opt. Lett. 16, 050003 (2018)

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Paper Information

Special Issue: ADVANCES IN METASURFACES

Received: Jan. 12, 2018

Accepted: Feb. 28, 2018

Published Online: Jul. 4, 2018

The Author Email: Xiangang Luo (lxg@ioe.ac.cn)

DOI:10.3788/COL201816.050003

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology