Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review

Nan Lin; Yunyi Chen; Xin Wei; Wenhe Yang; Yuxin Leng

doi:10.1017/hpl.2023.53

High Power Laser Science and Engineering, Volume. 11, Issue 5, 05000e64(2023)

Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review

Nan Lin^1,2、*, Yunyi Chen^1,2, Xin Wei^1,2, Wenhe Yang^1,2, and Yuxin Leng^2、*

Author Affiliations

¹School of Microelectronics, Shanghai University, Shanghai, China

²Department of Precision Optics Engineering, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China

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Nan Lin, Yunyi Chen, Xin Wei, Wenhe Yang, Yuxin Leng. Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review[J]. High Power Laser Science and Engineering, 2023, 11(5): 05000e64

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Paper Information

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Received: Mar. 22, 2023

Accepted: Jun. 20, 2023

Published Online: Oct. 7, 2023

The Author Email: Nan Lin (nanlin@siom.ac.cn), Yuxin Leng (lengyuxin@mail.siom.ac.cn)

DOI:10.1017/hpl.2023.53

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology