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Chinese Journal of Lasers, Volume. 47, Issue 8, 805003(2020)

Angular Position Distribution Algorithm of Micro Mirror Array Based on Genetic Algorithm

Zeng Zongshun1,2, Zhang Fang1, Niu Zhiyuan1, Ma Xiaozhe1,2, Zhu Siyu1,2, and Huang Huijie1,2
Author Affiliations
  • 1Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences, Shanghai 201800, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    AbstractGet PDF(in Chinese)
    Figures&Tables (11)
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    References (25)
    Cited By (10)
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    Figures & Tables(11)
    Diagram of freeform pupil illumination module

    Fig. 1. Diagram of freeform pupil illumination module

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    Sub-beam imaging diagram of freeform pupil illumination module

    Fig. 2. Sub-beam imaging diagram of freeform pupil illumination module

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    Flow chart of angular position distribution algorithm of MMA based on genetic algorithm

    Fig. 3. Flow chart of angular position distribution algorithm of MMA based on genetic algorithm

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    Pupil intensity distributions generated by MMA angular position distribution algorithm based on genetic algorithm. (a1)(b1)(c1) Target pupil intensity distributions; (a2)(b2)(c2) pupil intensity distributions after algorithm optimization

    Fig. 4. Pupil intensity distributions generated by MMA angular position distribution algorithm based on genetic algorithm. (a1)(b1)(c1) Target pupil intensity distributions; (a2)(b2)(c2) pupil intensity distributions after algorithm optimization

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    Changes of pupil intensity distribution during iteration of MMA angular position distribution algorithm based on genetic algorithm. (a) Free lighting mode 1; (b) free lighting mode 2; (c) free lighting mode 3

    Fig. 5. Changes of pupil intensity distribution during iteration of MMA angular position distribution algorithm based on genetic algorithm. (a) Free lighting mode 1; (b) free lighting mode 2; (c) free lighting mode 3

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    Angular position distributions gained from MMA angular position distribution algorithm based on genetic algorithm. (a) Free lighting mode 1; (b) free lighting mode 2; (c) free lighting mode 3

    Fig. 6. Angular position distributions gained from MMA angular position distribution algorithm based on genetic algorithm. (a) Free lighting mode 1; (b) free lighting mode 2; (c) free lighting mode 3

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    Comparison of optimization processes and results of MMA angular position distribution algorithms based on genetic algorithm and simulated annealing algorithm. (a) ERMS obtained based on genetic algorithm varying with iteration time; (b) ERMS obtained based on simulated annealing algorithm varying with iteration time; (c) comparison of ERMSresults between genetic algorithm and simulated annealing algorithm based methods

    Fig. 7. Comparison of optimization processes and results of MMA angular position distribution algorithms based on genetic algorithm and simulated annealing algorithm. (a) ERMS obtained based on genetic algorithm varying with iteration time; (b) ERMS obtained based on simulated annealing algorithm varying with iteration time; (c) comparison of ERMSresults between genetic algorithm and simulated annealing algorithm based methods

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    Schematic diagram of asymmetry in x and y directions for photoresist exposure pattern

    Fig. 8. Schematic diagram of asymmetry in x and y directions for photoresist exposure pattern

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    Partial typical photoresist exposure patterns used in simulation and CD difference distributions. (a) Partial typical photoresist exposure patterns used in simulation; (b) CD difference distributions between algorithm and target pupils

    Fig. 9. Partial typical photoresist exposure patterns used in simulation and CD difference distributions. (a) Partial typical photoresist exposure patterns used in simulation; (b) CD difference distributions between algorithm and target pupils

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    • Table 1. Simulation parameters of photolithography performance

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      Table 1. Simulation parameters of photolithography performance

      ItemFeature
      Numerical aperture (NA)1.35
      Pupil of illumination systemFree lighting modes 1, 2, and 3
      MaskPhase shifting mask, dark field
      Refractive index of image medium (immersion)1.44
      Refractive index for photoresist film (matched substrate)Photoresist: 1.70; substrate: 1.70
      Extinction coefficient for photoresist film (matched substrate)Photoresist: 0.02; substrate: 0.02
      Thickness for photoresist film (matched substrate)Photoresist: 100; substrate: ∞

    • Table 2. Simulation results of photolithography performance for AAsym distribution of photoresist exposure pattern

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      Table 2. Simulation results of photolithography performance for AAsym distribution of photoresist exposure pattern

      Pupil typeRMS_x /nmRMS_y /nm
      Free lightingmode 10.030.04
      TargetpupilFree lightingmode 20.030.03
      Free lightingmode 30.030.04
      Free lightingmode 10.030.03
      AlgorithmpupilFree lightingmode 20.030.03
      Free lightingmode 30.030.03
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    Zeng Zongshun, Zhang Fang, Niu Zhiyuan, Ma Xiaozhe, Zhu Siyu, Huang Huijie. Angular Position Distribution Algorithm of Micro Mirror Array Based on Genetic Algorithm[J]. Chinese Journal of Lasers, 2020, 47(8): 805003

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    Paper Information

    Category: Beam transmission and control

    Received: Jan. 17, 2020

    Accepted: --

    Published Online: Aug. 17, 2020

    The Author Email:

    DOI:10.3788/CJL202047.0805003

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology