Fig. 1. Preparation process diagram of donor film substrate

Fig. 2. Schematic of three-beam LIIFT Ag micro-dot. (a) Optical path diagram of three-beam LIIFT; (b) schematic of three-beam LIIFT process; (c) SEM image of transferred Ag micro-dot array

Fig. 3. SEM images of Ag micro-dot array structures transferred by LIIFT technology and statistical distribution results of Ag nanoparticles in single Ag micro-dot. (a1)‒(a3) SEM images of Ag micro-dot array structures transferred by LIIFT technology; (b1)‒(b3) magnification images of single micro-dots; (c1)‒(c3) statistical results of nanoparticle distributions in central regions (elliptic part) of single micro-dots in Figs. 3(b1)~(b3)

Fig. 4. Relationship between distribution of nanoparticles in Ag micro-dot structure and dot array period

Fig. 5. Three-beam interference simulation diagrams under TM-TM-TM mode. (a)‒(c) Interference patterns; (d)‒(f) interference light intensity distributions

Fig. 6. EDS analysis of transferred micro-dots. (a) SEM image of transferred micro-dots; (b) elemental analysis spectrum of transferred micro-dots; (c) surface distribution diagram of Si element in transferred micro-dot structure; (d) surface distribution diagram of Ag element in transferred micro-dot structure

Fig. 7. Raman spectra of RhB on Ag micro-dot substrates with different periods