Research on Super-Hard Anti-Reflection Coatings for Screens

Xiuhua Fu; Chengqi Tan; Gong Zhang; Xingyu Chen; Zhongju Ren; Yang Wang; Shuang Li

doi:10.3788/CJL202249.0603002

Chinese Journal of Lasers, Volume. 49, Issue 6, 0603002(2022)

Research on Super-Hard Anti-Reflection Coatings for Screens

Xiuhua Fu¹, Chengqi Tan^1、*, Gong Zhang¹, Xingyu Chen¹, Zhongju Ren¹, Yang Wang², and Shuang Li²

Author Affiliations

¹School of Opto-Electronic Engineering, Changchun University of Science and Technology, Changchun, Jilin 130022, China

²Optorun (Shanghai) Co., Ltd., Shanghai 200444, China

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Figures & Tables(14)

$Optical constants of Si3N4. (a) Refractive index; (b) extinction coefficient$

Fig. 1. Optical constants of Si₃N₄. (a) Refractive index; (b) extinction coefficient

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$Refractive indexes of SiON under different ICP gas-filling conditions$

Fig. 2. Refractive indexes of SiON under different ICP gas-filling conditions

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$Refractive indexes of SiAlON under different sputtering powers of Al target$

Fig. 3. Refractive indexes of SiAlON under different sputtering powers of Al target

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$Optical constants of SiAlON. (a) Refractive index; (b) extinction coefficient$

Fig. 4. Optical constants of SiAlON. (a) Refractive index; (b) extinction coefficient

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Fig. 5. Vickers hardness measuring conditions. (a) Load on sample versus time; (b) displacement into surface versus time

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Fig. 6. Test and design curves of sample spectrum

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Fig. 7. Test and design curves of sample spectrum after film system optimization

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Table 1. Equivalent dielectric constants and refractive indexes of SiON and AlON under different gas-filling conditions

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Table 1. Equivalent dielectric constants and refractive indexes of SiON and AlON under different gas-filling conditions

Flow of O₂ /( mL·min^－1)	Flow of N₂ /( mL·min^－1)	$f_{{Si}_{3} N_{4}}$ /%	ε_SiON	n_SiON	f_AlN /%	ε_AlON	n_AlON
0	140	100.0	4.080	2.020	100.0	4.326	2.080
45	110	55.0	3.111	1.764	88.0	4.107	2.027
90	80	30.8	2.675	1.636	72.7	3.842	1.960
135	50	15.6	2.428	1.558	52.6	3.514	1.875
180	20	5.3	2.269	1.506	25.0	3.099	1.760
225	0	0	2.190	1.480	0	2.756	1.660

Table 2. Process parameters of Si₃N₄

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Table 2. Process parameters of Si₃N₄

Material	TG2-Al		TG3/4-Si		ICP×2
Material	TG power /kW	Flow of Ar /(mL·min^－1)	TG power /kW	Flow of Ar /(mL·min^－1)	ICP power /kW	Flow of Ar /(mL·min^－1)	Flow of O₂ /(mL·min^－1)	Flow of N₂ /(mL·min^－1)
Si₃N₄	-	20*3	10	20*3	4	80	-	140

Table 3. Process parameters of SiAlON

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Table 3. Process parameters of SiAlON

Material	TG2-Al		TG3/4-Si		ICP×2
Material	TG power /kW	Flow of Ar /(mL·min^－1)	TG power /kW	Flow of Ar /(mL·min^－1)	ICP power /kW	Flow of Ar /(mL·min^－1)	Flow of O₂ /(mL·min^－1)	Flow of N₂ /(mL·min^－1)
SiAlON	1	20*3	10	20*3	4	80	180	20

Table 4. Vickers hardnesses of Si₃N₄ single layer film and SiAlON single layer film
View table
Table 4. Vickers hardnesses of Si₃N₄ single layer film and SiAlON single layer film
Material Measuring position Microhardness /HV
Si₃N₄ 1 2047.1
2 2028.5
SiAlON 1 1458.6
2 1513.2

Table 5. Process parameters of hard multilayer anti-reflection film

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Table 5. Process parameters of hard multilayer anti-reflection film

Material	TG2-Al		TG3/4-Si		ICP×2
Material	TG power /kW	Flow of Ar /(mL·min^－1)	TG power /kW	Flow of Ar /(mL·min^－1)	ICP power /kW	Flow of Ar /(mL·min^－1)	Flow of O₂ /(mL·min^－1)	Flow of N₂ /(mL·min^－1)
Si₃N₄	-	20*3	10	20*3	4	80	-	140
SiAlON	1	20*3	10	20*3	4	80	180	20

Table 6. Young’s modulus and Vickers hardness of multilayer hard anti-reflection coating
View table
Table 6. Young’s modulus and Vickers hardness of multilayer hard anti-reflection coating
Measuring position E /GPa Microhardness /HV
1 179.16 1799.8
2 172.55 1756.2
3 178.39 1775.7

Table 7. Film hardnesses of different low refractive index materials
View table
Table 7. Film hardnesses of different low refractive index materials
Material Film microhardness /HV
SiO₂ 1234
SiON 1583
SiAlON 1774

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Xiuhua Fu, Chengqi Tan, Gong Zhang, Xingyu Chen, Zhongju Ren, Yang Wang, Shuang Li. Research on Super-Hard Anti-Reflection Coatings for Screens[J]. Chinese Journal of Lasers, 2022, 49(6): 0603002

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Paper Information

Received: Jul. 13, 2021

Accepted: Aug. 16, 2021

Published Online: Mar. 2, 2022

The Author Email: Chengqi Tan (TanCQFilm@outlook.com)

DOI:10.3788/CJL202249.0603002

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology

Table 1. Equivalent dielectric constants and refractive indexes of SiON and AlON under different gas-filling conditions

Table 1. Equivalent dielectric constants and refractive indexes of SiON and AlON under different gas-filling conditions

Table 2. Process parameters of Si3N4

Table 2. Process parameters of Si3N4

Table 3. Process parameters of SiAlON

Table 3. Process parameters of SiAlON

Table 4. Vickers hardnesses of Si3N4 single layer film and SiAlON single layer film

Table 4. Vickers hardnesses of Si3N4 single layer film and SiAlON single layer film

Table 5. Process parameters of hard multilayer anti-reflection film

Table 5. Process parameters of hard multilayer anti-reflection film

Table 6. Young’s modulus and Vickers hardness of multilayer hard anti-reflection coating

Table 6. Young’s modulus and Vickers hardness of multilayer hard anti-reflection coating

Table 7. Film hardnesses of different low refractive index materials

Table 7. Film hardnesses of different low refractive index materials

Table 2. Process parameters of Si₃N₄

Table 2. Process parameters of Si₃N₄

Table 4. Vickers hardnesses of Si₃N₄ single layer film and SiAlON single layer film

Table 4. Vickers hardnesses of Si₃N₄ single layer film and SiAlON single layer film