Chinese Journal of Lasers, Volume. 36, Issue s1, 337(2009)

Investigation of n-Si and p-Si Semiconductors by Terahertz Time-Domain Spectroscopy

Jin Bin1、*, Li Tong2, Zhou Qingli1, Shi Yulei1, and Zhang Cunlin1
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  • 1[in Chinese]
  • 2[in Chinese]
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    Two kinds of semiconductor substrates, n-Si and p-Si, are investigated by the terahertz (THz) time-domain spectroscopy. The reference signals of free space and the sample signals are measured, and a series of optical parameters of these two samples in the range of 0.5~2.0 THz are calculated. The refractive index and real part of complex relative permittivity of n-Si are independent of frequencies, as well as p-Si. The extinction coefficient and imaginary part of complex relative permittivity of p-Si decrease with the increasing frequency, and this phenomenon is much more obvious than that of n-Si. The complex conductivity and dielectric loss also have been calculated. The obtained results indicate that n-Si and p-Si have good dielectric properties and can be used to work in the THz range.

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    Jin Bin, Li Tong, Zhou Qingli, Shi Yulei, Zhang Cunlin. Investigation of n-Si and p-Si Semiconductors by Terahertz Time-Domain Spectroscopy[J]. Chinese Journal of Lasers, 2009, 36(s1): 337

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    Paper Information

    Category: materials and thin films

    Received: --

    Accepted: --

    Published Online: Jun. 18, 2009

    The Author Email: Bin Jin (jinbin111111@163.com)

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