Acta Optica Sinica, Volume. 44, Issue 20, 2005001(2024)

Design and Fabrication of a Non‐Polarized Transmission Grating with High Diffraction Efficiency

Liangcheng Yu, Fanfan Lu, Shiyang Li, Manman Sun, and Keqiang Qiu*
Author Affiliations
  • National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230000, Anhui , China
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    Figures & Tables(20)
    Schematic diagram of grating structure. (a) Fused silica transmission grating; (b) encapsulated grating
    Effective refractive indices of TiO2 encapsulated grating as a function of filling factor. (a) Effective refractive indices of two polarization modes; (b) difference of effective refractive indices of two polarization modes
    Non-polarized (NP) diffraction efficiency distribution of TiO2 encapsulated grating at different groove depths and filling factors calculated by FEM
    Diffraction efficiency and polarization sensitivity curve for grating groove depth of 713 nm and filling factor of 0.384.
    Fused silica transmission grating designed by FEM. (a) NP diffraction efficiency distribution at different groove depths and filling factors; (b) diffraction efficiency and polarization sensitivity curve within waveband of fused silica transmission grating
    -1 order diffraction efficiency and polarization sensitivity of encapsulated grating as a function of wavelength. (a) -1 order diffraction efficiency; (b) polarization sensitivity
    NP diffraction efficiency distribution of encapsulated grating at (a) different thicknesses of Al2O3 and SiO2; (b) different groove depths and filling factors
    -1 order NP diffraction efficiency of encapsulated grating as a function of TiO2 excess thickness
    Polarization sensitivity (PS) distribution of encapsulated grating at (a) different thicknesses of Al2O3 and SiO2; (b) different groove depths and filling factors
    Polarization sensitivity of encapsulated grating as a function of TiO2 excess thickness
    Fabrication process diagram of encapsulated grating
    Characterization results of grating structure. (a) Fused silica transmission grating; (b) encapsulated grating
    Fabrication model diagram of encapsulated grating
    Comparison between experimental and theoretical values of grating diffraction efficiency under TE and TM polarized incidence. (a) TE polarized incidence; (b) TM polarized incidence
    Comparison between experimental and theoretical values of encapsulated gratings. (a) NP diffraction efficiency;
    • Table 1. Main parameters of transmission grating

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      Table 1. Main parameters of transmission grating

      ParameterValue
      Incident angle /(°)61.93
      Diffraction order-1
      Groove density /(lp·mm-12634
      Wavelength /nm630‒680
      Substrate materialFused silica
    • Table 2. Diffraction efficiencies and polarization sensitivities under different antireflection coating thicknesses

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      Table 2. Diffraction efficiencies and polarization sensitivities under different antireflection coating thicknesses

      Titanium oxide excess

      thickness h2 /nm

      Aluminum oxide

      thickness h3 /nm

      Silicon oxide

      thickness h4 /nm

      Diffraction

      efficiency /%

      Polarization

      sensitivity /%

      1115096.570.25
      11014096.420.21
      12013096.210.26
      1709096.250.32
      1809096.120.40
    • Table 3. Diffraction efficiencies and polarization sensitivities of encapsulated gratings under different groove depths and filling factors

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      Table 3. Diffraction efficiencies and polarization sensitivities of encapsulated gratings under different groove depths and filling factors

      Groove depth h1 /nmFilling factorDiffraction efficiency /%Polarization sensitivity /%
      6510.3996.140.060
      6520.3996.220.090
      6530.4096.470.060
      6540.4096.540.090
      6570.4196.660.008
      6620.4296.550.080
      6630.4296.560.030
    • Table 4. Optimal parameters for encapsulated grating structure

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      Table 4. Optimal parameters for encapsulated grating structure

      Groove depth

      h1 /nm

      Filling factor

      Titanium oxide excess

      thickness h2 /nm

      Aluminum oxide

      thickness h3 /nm

      Silicon oxide

      thickness h4 /nm

      6570.41110140
    • Table 5. Fabrication tolerance of encapsulated grating

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      Table 5. Fabrication tolerance of encapsulated grating

      ParameterValue
      Groove depth h1 /nm660±20
      Filling factor f=b/d0.41±0.04
      Titanium oxide excess thickness h2 /nm10±9
      Aluminum oxide thickness h3 /nm20±10
      Silicon oxide thickness h4 /nm140±10
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    Liangcheng Yu, Fanfan Lu, Shiyang Li, Manman Sun, Keqiang Qiu. Design and Fabrication of a Non‐Polarized Transmission Grating with High Diffraction Efficiency[J]. Acta Optica Sinica, 2024, 44(20): 2005001

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    Paper Information

    Category: Diffraction and Gratings

    Received: Mar. 22, 2024

    Accepted: May. 23, 2024

    Published Online: Oct. 11, 2024

    The Author Email: Keqiang Qiu (blueleaf@ustc.edu.cn)

    DOI:10.3788/AOS240761

    CSTR:32393.14.AOS240761

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