Laser & Optoelectronics Progress, Volume. 53, Issue 4, 42302(2016)
Fabrication of Large Size 1064 nm HfO2/SiO2 Narrow-Band Filters with High Laser Damage Threshold
Cited By
Article index updated: Mar. 15, 2025
The article is cited by 1 article(s) CLP online library. (Some content might be in Chinese.)
Tools
Get Citation
Copy Citation Text
Wu Xiaoming, Li Xin, Wang Yijian, Jiao Hongfei. Fabrication of Large Size 1064 nm HfO2/SiO2 Narrow-Band Filters with High Laser Damage Threshold[J]. Laser & Optoelectronics Progress, 2016, 53(4): 42302
Paper Information
Category: Optical Devices
Received: Sep. 13, 2015
Accepted: --
Published Online: Mar. 25, 2016
The Author Email: Xiaoming Wu (wxmly@263.net)
© Copyright 2018-2021 | Chinese Laser Press.
All Rights Reserved 沪ICP备15018463号-20